Skip to main content
Sensors
Sensors
Sensors
Main navigation
Home
People
Principal Investigators
Research Scientists and Engineers
Students
All Profiles
Alumni
Former Members
Visiting Scholars
Events
All Events
Events Calendar
News
Pages
Publications
ISL Publications Repository
Research Output
About
Research
Oppotunities
Publications
Patents
Contact Us
nanoseparations
Achieving nanoscale horizontal separations in the standard 2 μm PolyMUMPS process
1 min read ·
Tue, Apr 29 2014
News
Circuits
PolyMUMPS
nanoseparations
Amro M Elshurafa, et al., "Achieving nanoscale horizontal separations in the standard 2 μm PolyMUMPS process." Applied Nanoscience 4 (2), 2014, 241. This paper shares with the research community how to achieve, effectively and easily, lateral submicron separations in the standard 2 μm PolyMUMPS process without any fabrication intervention or post-processing, based on the oxide sidewall spacer technique. Thousands of nanoseparations were created and successfully tested by visual inspection and by a simple capacitance measurement. The lateral separations attained were less than 440 nm and